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UVTM Rotatable SiAl Alloy Target 

  Category : Electronic and electrical->Electronic Parts->sputtering target

     
UVTM Rotatable SiAl Alloy Target
 
       

  Product Specification
 
  Model No:      UVTM
  Country  CN
  Brand  UVTM
  Materials  According to the order
  Size  Customized    
  Weight  customized
  Color  customized
  Packing  Wooden case
  Minimum Order  1pcs
  Payment Term  L/C, T/T,Paypal

 

    Product Detail
  Material type: Silicone Aluminum
Symbol: SiAl
Proportion: 90:10wt%±1%
Purity: >99.9%
Color/Appearance: Silvery,Metallic
Dentity: >2.2g/m3(>94%)
Molding Process: HPS

Maximum Impurities content Unit: ppm

Fe ≤500 Cu ≤40 Ca ≤60
Ga ≤25 Zn ≤70 Ti ≤20
Ni ≤30 N ≤150 O ≤6000

UVTM offer a wide range of ceramic and metallic sputter targets, in planner and rotatable shape,a complate range of targets. Consistent,tightly controled chemistry the target enable better control the resulting solar cell chemistry and morphology.

UVTM providing lots of sputtering targets with high purity and density: Ag, SiAl, NbOx, MoNb, Cr, Si, Al Alloy, NiCr, etc.
UVTM successfully develope 10mm unilateral rotary NbOx Target, and break the routine thickness of the ceramic target. Meanwhile successfully develop rotatable Ag target, suitable for large area of LOW-E glass coating.
UVTM runs a very strict quality control(QC) system, including raw materials selection, production control, products inspections, fine packing and delivery.

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